Author:
Bingel Astrid,Füchsel Kevin,Kaiser Norbert,Tünnermann Andreas
Abstract
AbstractAluminum-doped zinc oxide (AZO) is one of the most promising transparent conductive oxide (TCO) materials that can substitute the high-quality but costly indium tin oxide (ITO). To ensure high-quality films as well as moderate production costs, inline DC magnetron sputtering was chosen to deposit thin AZO films. The influence of sputter gas pressure, substrate temperature, and film thickness on the electrical, optical, and structural properties was analyzed. The resistivity reaches a minimum of 1.3×10
Subject
Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
3 articles.
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