Investigation of the oxidation process in GeTe-based phase change alloy using Ge K-edge XANES spectroscopy

Author:

Krbal Milos1,Kolobov Alexander V.23,Fons Paul24,Nitta Kiyofumi4,Uruga Tomoya4,Tominaga Junji2

Affiliation:

1. Center of Materials and Nanotechnologies (CEMNAT), Faculty of Chemical Technology , University of Pardubice , Legions Square 565 , 530 02 Pardubice , Czech Republic

2. Nanoelectronics Research Institute , National Institute of Advanced Industrial Science and Technology 1-1-1 Higashi , Tsukuba 305-8562, Ibaraki , Japan

3. Department of Physical Electronics , Herzen State Pedagogical University , 48 Moika Embankment , 191186 St Petersburg , Russia

4. SPring8, Japan Synchrotron Radiation Institute (JASRI) , Kouto 1-1-1, Sayo-cho, Sayo-gun , Hyogo 679-5198 , Japan

Abstract

Abstract In this work, we clearly demonstrate the efficacy of using XANES spectroscopy in conjunction with a Pilatus detector as a sensitive tool to allow the study of the oxidation process in GeTe alloys via depth profile analysis. On the basis of Ge K-edge XANES spectra, it was found that GeTe alloys do not oxidize readily after an initial native surface oxidation that occurs upon exposure to oxygen in the air at the elevated temperatures, 100 °C and 330 °C. We demonstrate that amorphous GeTe possesses a higher predisposition to oxidation than crystalline GeTe when exposed to the air at temperature of 100 °C. When the temperature is set to 330 °C in an air ambient, we show that the amorphous to crystal phase transition affects the oxidation process more significantly than the simple annealing of crystalline GeTe. We suggest that the higher tendency of GeTe films to oxidize during the phase transition is a consequence of the breaking of Ge–Ge bonds in the presence of oxygen atoms which subsequently leads to the extra formation of Ge–O bonds during crystallization.

Publisher

Walter de Gruyter GmbH

Subject

General Chemical Engineering,General Chemistry

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