Enhanced dual-DOF PI-PD control of integrating-type chemical processes

Abstract

Abstract A dual-degree of freedom (dual-DOF) propor-tional-integral proportional-derivative (PI-PD) controller is developed for integrating-type chemical processes with delay. The interior-loop PD controller is designed based on user-defined gain and phase margin. For designing the external-loop PI controller, the moment-matching method is augmented with maximum sensitivity specifications. The suggested design is suitable for chemical processes like continuously stirred tank reactors, boiler steam drums, heat exchangers and distillation columns. Using benchmark models of the aforementioned processes, the closed-loop system outputs and control signals are compared to vindicate the primacy of the suggested dual-DOF PI-PD controller. To study the performance-robustness trade-off of this design, rigorous perturbation analysis is also carried out. The performance improvement achieved by the suggested dual-DOF PI-PD controller is also quantitatively compared with contemporary works.