Applying metal coatings to dielectric materials by photochemical processes

Author:

Koshkarbaeva Shayzada1,Janpaizova Vasilya1,Amanbaeva Kalamkas1,Sataev Malik1,Abdurazova Perizat1ORCID,Serikbaeva Bagdagul1,Raiymbekov Yerkebulan1

Affiliation:

1. M.Auezov South Kazakhstan University , Shymkent , Kazakhstan

Abstract

Abstract Photochemical processes in thin surface layers of solutions of compounds of the copper subgroup elements leading to the formation of dispersed metal particles on the surface of dielectrics are investigated. It is shown that dispersed particles of elemental gold are formed on dielectrics moistened with AuCl3 solution and exposed to sunlight. At the same time, there is no need to use any chemical reducing agents. On cotton fabrics moistened with solutions of AgNO3, CuBr2, when exposed to sunlight, silver and copper monohalides are formed, respectively. These processes take place with the participation of terminal cellulose molecules and also do not require the use of chemical reducing agents. In addition, it was found that copper monohalides can be converted into elemental copper particles by a photochemical reaction involving ascorbic acid. Examples of metallization of a number of dielectrics using photochemical activation using sunlight are given.

Publisher

Walter de Gruyter GmbH

Subject

General Chemical Engineering

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3