Photocatalytic degradation of naproxen using single-doped TiO2/FTO and co-doped TiO2-VO2/FTO thin films synthesized by sonochemistry

Author:

Orozco-Gonzalez Luis Rene1,Acosta-Najarro Dwight Roberto1,Magaña-Zavala Carlos Raúl1,Tavizón-Pozos Jesus Andres2,Cervantes-Cuevas Humberto3,Chavez-Esquivel Gerardo3ORCID

Affiliation:

1. Instituto de Física, Universidad Nacional Autónoma de México, Cuidad Universitaria , Coyoacan , Ciudad de México 20364 , México

2. Investigadoras e Investigadores por México CONACYT, Área Académica de Química , Universidad Autónoma del Estado de Hidalgo , Carr. Pachuca-Tulancingo km 4.5 , Pachuca 42184 , Hidalgo , México

3. Departamento de Ciencias Básicas, División de Ciencias Básicas e Ingeniería , Universidad Autónoma Metropolitana-Azcapotzalco , Av. San Pablo 180, Col. Reynosa Tamaulipas, Azcapotzalco , Ciudad de México 02200 , México

Abstract

Abstract Single-doped TiO2/FTO and co-doped TiO2-VO2/FTO thin films were prepared by sonochemistry and spray pyrolysis deposition on FTO substrates. The co-deposition of TiO2-VO2 on FTO significantly changed the morphological, structural, optical, and photocatalytical properties compared to the single-deposition. X-ray diffraction and HRTEM results showed polycrystalline film structures composed of SnO2-tetragonal from FTO, anatase-TiO2, rutile-TiO2, and monoclinic-VO2 phases. The co-deposition technique increases the particle size distribution by approximately two times compared to simple deposition. The single-doped TiO2/FTO thin film had a 15% higher bandgap than the co-doped TiO2-VO2/FTO thin film, and the electrical resistivity calculated from the van der Pauw method was 55.3 MΩ sq−1 for the TiO2-VO2/FTO co-doped thin film, 2.7 times lower than that obtained for the TiO2/FTO thin film. Single-doped TiO2/FTO and co-doped TiO2-VO2/FTO thin films presented pseudo-first-order reactions at pH 6.5, with kinetic constants of 0.026 and 0.015 min−1, respectively. This behavior is related to the production of inactive or less active aggregates by the addition of vanadium during the co-doping process, which led to lattice contraction, which encouraged the formation of the rutile phase rather than the anatase phase. However, the co-doped thin film can modify the metal-insulator transition compared to the single-doped TiO2/FTO thin film. Furthermore, co-deposition decreased the bandgap value by 16% compared to single-deposition thin film. In this sense, co-doped TiO2-VO2/FTO thin films inhibited the recombination of photogenerated carriers and the formation of reactive oxygen species involved in the photocatalytic degradation of naproxen.

Publisher

Walter de Gruyter GmbH

Subject

General Chemical Engineering

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