Abstraction NBTI model
Author:
Affiliation:
1. Carl von Ossietzky University of Oldenburg , Department of Computer Science, Division of Embedded Hardware/Software Systems , Oldenburg , Germany
Abstract
Publisher
Walter de Gruyter GmbH
Subject
General Computer Science
Link
https://www.degruyter.com/document/doi/10.1515/itit-2021-0005/pdf
Reference50 articles.
1. H. Reisinger, O. Blank, W. Heinrigs, A. Muhlhoff, W. Gustin and C. Schlünder. Analysis of NBTI Degradation- and Recovery-Behavior Based on Ultra Fast VT-Measurements. Proceedings of the IEEE IRPS, pp. 448–453, San Jose, 2006.
2. T. Grasser, B. Kaczer, W. Goes, T. Aichinger, P. Hehenberger and M. Nelhiebel. A two-stage model for negative bias temperature instability. Proceedings of the IEEE IRPS, pp. 33–44, Montreal, 2009.
3. T. Grasser, H. Reisinger, P.-J. Wagner, F. Schanovsky, W. Goes and B. Kaczer. The time dependent defect spectroscopy (TDDS) for the characterization of the bias temperature instability. Proceedings of the IEEE IRPS, pp. 16–25, Anaheim, 2010.
4. T. Grasser et al. Characterization and modeling of charge trapping: From single defects to devices. Proceedings of the IEEE International Conference on IC Design Technology, pp. 1–4, Austin, 2014.
5. G. Rzepa et al. Efficient physical defect model applied to PBTI in high-κ stacks. Proceedings of the IEEE IRPS, pp. XT-11.1–XT-11.6, Monterey, 2017.
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