1. [1] U. Özgür, Y. I. Alivov, C. Liu, A. Teke, M.A. Reshchnikov, S. Dogan, V. Avrutin, S.-J. Cho and H. Morkoç “A comprehensive review of ZnO materials and devices”, Journal of Applied Physics, vol. 98 no. 4 (2005), 041301.
2. [2] L.-Y. Chen, W.-H. Chen, J. J. Wang, F. C.-N. Hong and Y.-K. Su “Hydrogen-doped high conductivity ZnO films deposited by radio-frequency magnetron sputtering”, Applied Physics Letters, vol. 85 no. 23 (2004), 5628-5630.10.1016/j.physletb.2004.01.081
3. [3] F. Bustanafruz, M. Fazli, M. R. Mohammadizadeh and M. Jafar Tafreshi, “Optical and electronic properties of H-doped ZnO”, Optical and Quantum Electronics, vol. 48 no. 5 (2016),.10.1007/s11082-016-0575-1
4. [4] P. Kelly and R. Arnell, “Magnetron sputtering: a review of recent developments and applications”, Vacuum, vol. 56 no. 3 (2000), 159-172.10.1016/S0042-207X(99)00189-X
5. [5] Z. Remes, J. Stuchlik, A. Purkrt, Y.-Y. Chang, J. Jirasek, P. Stenclova, V. Prajzler and P. Nekvindova, “ZnO Thin Films Prepared by Reactive Magnetron Sputtering”, NANOCON 2016 - 8th International Conference on Nanomaterials - Research and Application, Conference Proceedings, 8 vol. Hotel Voronez I, Brno, Czech Republic, TANGER Ltd.(2016).