Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair-Reference-Cited by-同舟云学术

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Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair

Published:2012-01-01 Issue:4 Volume:1 Page:
ISSN:2192-8584
Container-title:Advanced Optical Technologies
language:
Short-container-title:

Author:

Pang Linyong,Peng Danping,Hu Peter,Chen Dongxue,He Lin,Li Ying,Satake Masaki,Tolani Vikram

Publisher

Walter de Gruyter GmbH

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

https://www.degruyter.com/view/j/aot.2012.1.issue-4/aot-2012-0127/aot-2012-0127.pdf

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Line-edge-roughness characterization of photomask patterns and lithography-printed patterns;Precision Engineering;2024-06

2. Inverse lithography technology: 30 years from concept to practical, full-chip reality;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-08-31

3. Benchmarking Five Global Optimization Approaches for Nano-optical Shape Optimization and Parameter Reconstruction;ACS Photonics;2019-09-17

4. Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion;SPIE Proceedings;2017-06-26

5. Reconstruction of photonic crystal geometries using a reduced basis method for nonlinear outputs;SPIE Proceedings;2016-03-14

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