Interferometric Surface Relief Measurements with Subnano/Picometer Height Resolution-Reference-Cited by-同舟云学术

Interferometric Surface Relief Measurements with Subnano/Picometer Height Resolution

Published:2017-10-01 Issue:5 Volume:17 Page:213-218
ISSN:1335-8871
Container-title:Measurement Science Review
language:en
Short-container-title:

Author:

Sysoev Evgeny¹,Kosolobov Sergey²,Kulikov Rodion¹,Latyshev Alexander²,Sitnikov Sergey²,Vykhristyuk Ignat¹

Affiliation:

1. Technological Design Institute of Scientific Instrument Engineering , Siberian Branch of the Russian Academy of Sciences (TDI SIE SB RAS) , 41, Russkaya str., 630058 , Novosibirsk , Russian Federation

2. A.V. Rzhanov Institute of Semiconductor Physics , Siberian Branch of the Russian Academy of Sciences (ISP SB RAS) , 13, Academika Lavrentieva Prospekt, 630090 , Novosibirsk , Russian Federation

Abstract

Abstract We present an optical interference system nanoprofiler MNP-1 designed for high-precision noncontact measurement of surface relief with subnanometer resolution (root mean square of measured values), based on partial scanning of interference signal. The paper describes the construction of the measurement system with Linnik interferometer and the algorithm for nanorelief surface reconstruction. Experimental measurement results of silicon sample with profile height of surface structure of one interatomic distance obtained by MNP-1 are shown. It was proposed to use an atomically smooth surface as the reference mirror in the interferometer MNP-1 that allowed us to measure monatomic steps of the presented silicon sample. Monatomic steps of 0.31 nm in height on silicon (111) surface were measured with resolution up to 5 pm.

Publisher

Walter de Gruyter GmbH

Subject

Instrumentation,Biomedical Engineering,Control and Systems Engineering

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