Development of a metrology technique suitable for in situ measurement and corrective manufacturing of freeform optics

Author:

Burada Dali Ramu1,Pant Kamal K.12,Mishra Vinod13,Bichra Mohamed4,Khan Gufran Sayeed1ORCID,Sinzinger Stefan4,Shakher Chandra1

Affiliation:

1. Instrument Design Development Centre , Indian Institute of Technology Delhi , New Delhi 110016 , India

2. Instruments Research and Development Establishment , Dehradun 248008 , India

3. CSIR-Central Scientific Instruments Organisation , Chandigarh 160030 , India

4. Fachgebiet Technische Optik , Technische Universität Ilmenau , 98693 Ilmenau , Germany

Abstract

Abstract The applications of freeform optical surfaces in modern optical systems are providing unique solutions over rotationally symmetric surfaces. These surfaces offer higher degrees of freedom to the designer to enhance the high-end performance of the optical system. The precise metrology of freeform optics is one of the major bottlenecks for its use in imaging applications. Modern optical fabrication methods (i.e. fast or slow tool servo configuration) are, in principle, capable to meet the challenges to generate complex freeform surfaces if supported by precise metrology feedback for error compensation. In the present work, we have developed a Shack-Hartmann sensor-based metrology technique that can be used for quantitative in situ measurement of freeform optics. The sensor head is used to measure freeform optics in the reflection mode by following the CNC tool path in the offline mode. The measurements are used as feedback for corrective machining. Quantitative analysis is also performed to estimate the error budget of the metrology system. Further, the proposed in situ metrology scheme is validated by measuring freeform surface using a coherence correlation interferometric optical profiler.

Publisher

Walter de Gruyter GmbH

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference40 articles.

1. F. Duerr, Y. Meuret and H. Thienpont, Opt. Express 21, 31072–31081 (2013).

2. F. Z. Fang, X. D. Zhang, A. Weckenmann, G. X. Zhang and C. Evans, CIRP Ann. Manuf. Technol. 62, 823–846 (2013).

3. X. Zhang, L. Zheng, X. He, L. Wang, F. Zhang, et al., Proc. SPIE 8486 (2012).

4. N. Takaki and P. R. Jannick, International Optical Design Conference, 10590 (International Society for Optics and Photonics, 2017).

5. F. Kyle, P. R. Jannick and P. Th. Kevin, Opt. Express 19, 21919–21928 (2011).

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3