Negative index metamaterial at ultraviolet range for subwavelength photolithography

Abstract

Abstract A negative index metamaterial (NIM) at ultraviolet range is constructed with stacked plasmonic waveguides. Based on the waveguides performing antisymmetric modes, the negative refractions of both wavevector and energy flow are realized when a TM-polarized light with a wavelength of 365 nm incidents on the plane of the layers. It is proved that the NIM could be introduced into subwavelength photolithography for extending working distance. Both theoretical and experimental results indicate that the patterns with a feature size of 160 nm can be reproduced in photoresist with a 100 nm-thick air working distance. Moreover, arbitrary two-dimensional patterns with a depth reach 160 nm can be obtained without diffraction fringe by employing a nonpolarized light. This design gives new insights into the manipulation of light. The improved working distance, well-shaped patterns over large area present an innovative method for improving subwavelength photolithography.