Facile fabrication of stretchable photonic Ag nanostructures by soft-contact patterning of ionic Ag solution coatings

Author:

Kim Minwook1ORCID,Oh Dong Kyo2ORCID,Kim Jeong Dae13ORCID,Jeong Minsu2,Kim Hongyoon2,Jung Chunghwan4,Song Jungkeun1,Lee Wonjun1,Rho Junsuk2456ORCID,Ok Jong G.1ORCID

Affiliation:

1. Department of Mechanical and Automotive Engineering , Seoul National University of Science and Technology , Seoul 01811 , Republic of Korea

2. Department of Mechanical Engineering , Pohang University of Science and Technology (POSTECH) , Pohang 37673 , Republic of Korea

3. Etch Team, SEMES Co., Ltd. , Cheonan , Chungcheongnam-do 31040 , Republic of Korea

4. Department of Chemical Engineering , Pohang University of Science and Technology (POSTECH) , Pohang 37673 , Republic of Korea

5. POSCO-POSTECH-RIST Convergence Research Center for Flat Optics and Metaphotonics , Pohang 37673 , Republic of Korea

6. National Institute of Nanomaterials Technology (NINT) , Pohang 37673 , Republic of Korea

Abstract

Abstract We describe a rapid and simple method to create Ag nanostructures by using direct mechanical patterning of ionic Ag ink coating under gentle pressure, then thermal annealing to reduce the ionic Ag ink to a metallic Ag layer. The ionic liquid-phase Ag coating is easily obtained by spin-coating ionic Ag ink that has appropriate Ag concentration and can be either printed or imprinted on the desired substrate by using a soft elastomer patterning mold, then reduced to the Ag nanostructure by subsequent thermal annealing. More specifically, we present two methods: transfer printing and soft nanoimprinting. In transfer printing, the ionic Ag ink is first inked onto the elastomer mold which then contacts the target substrate to transfer the Ag nanopattern. In soft nanoimprinting, the elastomer mold conducts soft imprinting to engineer the ionic Ag ink coating to the Ag nanostructure. We systematically investigate the optimal patterning conditions by controlling the initial Ag ink concentration and the coating, printing, imprinting, and annealing conditions, to derive Ag architecture that has tunable photonic functionality. As an example, we demonstrate polarization-sensitive reflective color filters that exploit shape-tunable Ag nanostructures fabricated by soft nanoimprinting using a controllably-stretched elastomer mold.

Publisher

Walter de Gruyter GmbH

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials,Biotechnology

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