Inverse design of high-NA metalens for maskless lithography-Reference-Cited by-同舟云学术

Inverse design of high-NA metalens for maskless lithography

Published:2023-02-28 Issue:13 Volume:12 Page:2371-2381
ISSN:2192-8614
Container-title:Nanophotonics
language:en
Short-container-title:

Author:

Chung Haejun¹²^ORCID,Zhang Feng³,Li Hao⁴,Miller Owen D.⁴,Smith Henry I.³⁵

Affiliation:

1. Department of Electronic Engineering , Hanyang University , Seoul , 04763 , South Korea

2. Department of Artificial Intelligence , Hanyang University , Seoul , 04763 , South Korea

3. LumArray, Inc. , 15 Ward Street , Somerville , MA 02143 , USA

4. Department of Applied Physics and Energy Sciences Institute, Yale University , New Haven , CT 06511 , USA

5. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology (MIT) , Cambridge , MA 02139 , USA

Abstract

Abstract We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry. First, we derive a computational upper bound for a unit-cell-based axisymmetric metalens. Then, we demonstrate a fabrication-compatible inverse-designed metalens with 85.50% transmission normalized focusing efficiency at 0.6 numerical aperture at 405 nm wavelength; a higher efficiency than a theoretical gradient index lens design (79.98%). We also demonstrate experimental validation for our axisymmetric inverse-designed metalens via electron beam lithography. Metalens-based maskless lithography may open a new way of achieving low-cost, large-area nanofabrication.

Funder

National Research Foundation of Korea

Korea Semiconductor Research Consortium

Ministry of Trade, Industry and Energy

High-Potential Individuals Global Training Program

Artificial Intelligence Graduate School Program

Institute for Information and Communications Technology Planning and Evaluation

Publisher

Walter de Gruyter GmbH

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials,Biotechnology

Link

https://www.degruyter.com/document/doi/10.1515/nanoph-2022-0761/pdf

Reference55 articles.

1. H. I. Smith, R. Menon, A. Patel, D. Chao, M. Walsh, and G. Barbastathis, “Zone-plate-array lithography: a low-cost complement or competitor to scanning-electron-beam lithography,” Microelectron. Eng., vol. 83, nos. 4–9, pp. 956–961, 2006. https://doi.org/10.1016/j.mee.2006.01.226.

2. D. Chao, A. Patel, T. Barwicz, H. I. Smith, and R. Menon, “Immersion zone-plate-array lithography,” J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct. Process., Meas., Phenom., vol. 23, no. 6, pp. 2657–2661, 2005. https://doi.org/10.1116/1.2127942.

3. H. I. Smith, “A proposal for maskless, zone-plate-array nanolithography,” J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct. Process., Meas., Phenom., vol. 14, no. 6, pp. 4318–4322, 1996. https://doi.org/10.1116/1.589044.

4. L. Pang, Y. Liu, and D. Abrams, “Inverse lithography technology (ILT): what is the impact to the photomask industry?,” in Photomask and Next-Generation Lithography Mask Technology XIII, vol. 6283, Yokohama, Japan, SPIE, 2006, pp. 233–243.

5. P. Wang, N. Mohammad, and R. Menon, “Chromatic-aberration-corrected diffractive lenses for ultrabroadband focusing,” Sci. Rep., vol. 6, no. 1, pp. 1–7, 2016. https://doi.org/10.1038/srep21545.

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advances in machine learning optimization for classical and quantum photonics;Journal of the Optical Society of America B;2024-02-01

2. Inverse Design of Electromagnetic Phase Singularities;2023 8th IEEE International Conference on Network Intelligence and Digital Content (IC-NIDC);2023-11-03

3. Inverse design and optical vortex manipulation for thin-film absorption enhancement;Nanophotonics;2023-10-26

4. Special issue: Metamaterials and plasmonics in Asia, a tribute to Byoungho Lee;Nanophotonics;2023-06-02