Field Enhancements of Packed-Bed Performance for Low-Concentration Acidic and Basic-Waste Gases from Semiconductor Manufacturing Process

Author:

Chein Hung Min1,Aggarwal Shankar Gopala1,Wu Hsin Hsien1,Chen Tzu Ming1,Huang Chun-Chao1

Affiliation:

1. a Environmental Nanotechnology Research Laboratory, Center for Environmental, Safety, and Health Technology Development, Industrial Technology Research Institute , Hsinchu , Taiwan , Republic of China

Publisher

Informa UK Limited

Subject

Management, Monitoring, Policy and Law,Waste Management and Disposal

Reference12 articles.

1. Schifftner, K.C.; Hesketh, H.E. Wet Scrubbers, 2nd ed.; Technomic: Lancaster, PA, 1996.

2. Cooper, C.D.; Alley, F.C. Air Pollution Control: A Design Approach, 2nd ed.; Waveland: Prospect Heights, IL, 1994, pp 411-439.

3. Huang, C.C.; Tsai, C.J.; Chein, H.M.; Chen, T.M.; Agarwal, S. Study of Removal Efficiency of Wet Scrubber for Acidic and Basic Aerosols. In Proceedings of the 6th International Aerosol Conference, Taipei, Taiwan, September 8–13, 2002, pp 993-994.

4. Air Pollution Regulation and Emission Standard for Semiconductor Manufacturing Industry, Taiwan Environmental Protection Administration: Taipei, Taiwan, April 2000.

5. Chein, T-W.; Chu, H; Removal of SO2 and No From Flue gas by wet Scrubbing Using an Aqueous NaClO2 Solution; J. Hazardous Materials. 2000, 80, 43-57.

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