REMOVAL OF SILICA PARTICLES FROM SILICON SUBSTRATES USING MEGASONIC CLEANING
Author:
Publisher
Informa UK Limited
Subject
General Chemical Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/02726359708906776
Reference20 articles.
1. Frequency dependence of ultrasonic cleaning
2. Ultrasonically enhanced chemical dissociation from solid surfaces with application to cleaning electronic circuit boards
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