PD Processes for Photography at Extreme Resolution: I. PD-MD Based on Diazosulphonate*-Reference-Cited by-同舟云学术

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PD Processes for Photography at Extreme Resolution: I. PD-MD Based on Diazosulphonate*

Published:1971-11 Issue:6 Volume:19 Page:187-198
ISSN:0022-3638
Container-title:The Journal of Photographic Science
language:en
Short-container-title:The Journal of Photographic Science

Author:

Jonker H.,Van Beek K.H.,Houtman H.J.,Klostermann F.T.,Spiertz E.J.

Publisher

Informa UK Limited

Subject

General Physics and Astronomy,General Arts and Humanities

Link

http://www.tandfonline.com/doi/pdf/10.1080/00223638.1971.11737608

Reference13 articles.

1. See, for example, Stevens, G. W. W., Microphotography- Photography and Photofabrication at Extreme Resolution, 2nd Edn., Chapman and Hall, London, 1968, p. 349.

2. Ref. 2, p. 216.

3. Ref. 2, Fig. 9, p. 27.

4. Ref. 2, p. 25.

5. Fritz, G. W., and Lavato, A., Kodak Photoresist Seminar Proceedings-1968 Edition, Vol. 1, p. 39.

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2. Electrochemical Study of Autocatalytic Bismuth(III) Reduction with Ti(III)‐Complexes;Journal of The Electrochemical Society;1993-12-01

3. Photochromic Compounds with N=N and C=N Chromophores;Organic Photochromes;1990

4. Photographic Image Enhancement Using Chemical Treatment Techniques;Optical Engineering;1981-10-01

5. Thin films as photographic information storage devices;Thin Solid Films;1972-11

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