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2. Davis, R. and Pope, C. I. “Techniques for ruling and etching precise scales in glass and their reproduction by photoetching with a new light-sensitive resist”, National Bureau of Standards, Circular 565 (August 1955).
3. Kodak Ltd. “Photofabrication using ‘Kodak’ Photo Resist Type 3 and ancillary chemicals”, p. 2 (July 1976).
4. Allen, D. M., Horne, D. F. and Stevens, G. W. W. “Quantitative examination of photofabricated profiles”. Parts I and 2 submitted for publication inThe Production Engineer.
5. DeForest, W. S. “Photoresist Materials and Processes” (McGraw-Hill, New York, 1975), p. 24.