Design of Holographic Condenser Lens for Visible Light Lithography-Reference-Cited by-同舟云学术

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Design of Holographic Condenser Lens for Visible Light Lithography

Published:2024-06-27 Issue: Volume: Page:1-8
ISSN:0377-2063
Container-title:IETE Journal of Research
language:en
Short-container-title:IETE Journal of Research

Author:

Yadav Shweta¹,Sinha Rashmi¹,Deo Nirmalendu²,Nath Vijay³^ORCID

Affiliation:

1. Department of Electronics and Communication Engineering, National Institute of Technology, Jamshedpur, India

2. Semiconductor Research and Product Development Division, Next Generation Technology Inc, Schaumburg, IL, USA

3. Department of Electronics & Communication Engineering, Birla Institute of Technology Mesra, Ranchi, India

Publisher

Informa UK Limited

Link

https://www.tandfonline.com/doi/pdf/10.1080/03772063.2024.2368634

Reference48 articles.

1. EUV Lithography, Second Edition

2. Photolithography and Electrolithography for Fine Geometry Semiconductor Devices

3. Photolithographic Methods for Vlsi: Myths and Beliefs

4. Euv uv lithography patterning challenges;Naulleau P.;Mater. Process Next Gen. Lithogr.,2016

5. H. J. Levinson. Priciples of Lithography, 2nd ed. Bellingham, Washington: Spie Press, 2005.

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