Subject
Fluid Flow and Transfer Processes,Process Chemistry and Technology,General Energy,Fuel Technology,Water Science and Technology,Renewable Energy, Sustainability and the Environment
Cited by
13 articles.
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1. Fundamentals for Studying the Physics of Cat-CVD and Difference from PECVD;Catalytic Chemical Vapor Deposition;2019-02-15
2. Hydrogenated amorphous silicon deposited at very high growth rates by an expanding Ar–H2–SiH4 plasma;Journal of Applied Physics;2001-02-15
3. Palladium thin films grown by CVD from (1,1,1,5,5,5-hexafluoro-2,4-pentanedionato) palladium(II);Chemical Vapor Deposition;1997-10
4. Palladium Thin Films Grown by CVD from (1,1,1,5,5,5-Hexafluoro-2,4-pentanedionato) Palladium(II);Chemical Vapor Deposition;1997-03
5. Simultaneous real‐time spectroscopic ellipsometry and reflectance for monitoring thin‐film preparation;Review of Scientific Instruments;1994-11