Growth of (Ba,Sr)TiO 3 Thin Films by MOCVD: Stoichiometry Effects-Reference-Cited by-同舟云学术

Growth of (Ba,Sr)TiO 3 Thin Films by MOCVD: Stoichiometry Effects

Published:2002-01 Issue:1 Volume:45 Page:59-68
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Ehrhart P.¹,Fitsilis F.¹,Regnery S.¹²,Waser R.¹,Schienle F.²,Schumacher M.²,Juergensen H.²,Krumpen W.³

Affiliation:

1. a IFF/EKM , Forschungszentrum Jülich GmbH , Jülich , D-52425 , Germany

2. b AIXTRON AG , Kackertstr. 15 - 17, Aachen , D-52072 , Germany

3. c ZCH , Forschungszentrum Jülich GmbH , Jülich , D-52425 , Germany

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584580215342

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