Recent Progress of Liquid Source Misted-Chemical Deposition System for Ferroelectric Materials
Author:
Affiliation:
1. a Samco International Inc. , 36 waraya-cho, Takeda, Fushimi-ku, Kyoto, Japan , 612-8443
2. b Nara Institute of Science and Technology (NAIST) , 8916-5 Takayama-cho, Ikoma, Nara, Japan , 630-0101
Publisher
Informa UK Limited
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/10584580490456182
Reference6 articles.
1. Liquid source misted chemical deposition (LSMCD)–a critical review
2. Use of the ‘mist’ (liquid-source) deposition system to produce new high-dielectric devices: ferroelectric-filled photonic crystals and Hf-oxide and related buffer layers for ferroelectric-gate FETs
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1. Mist fabrication of light emitting diodes with colloidal nanocrystal quantum dots;Applied Physics Letters;2008-01-14
2. PRECURSOR CHEMISTRY FOR POLAR NANOTUBES;Integrated Ferroelectrics;2007-12-06
3. HIGH-TEMPERATURE AMORPHOUS HAFNIA (HfO2) FOR MICROELECTRONICS;Integrated Ferroelectrics;2005-09
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