Extreme Ultraviolet Interferometric Lithography: A Path to Nanopatterning-Reference-Cited by-同舟云学术

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Extreme Ultraviolet Interferometric Lithography: A Path to Nanopatterning

Published:2008-08-08 Issue:4 Volume:21 Page:12-24
ISSN:0894-0886
Container-title:Synchrotron Radiation News
language:en
Short-container-title:Synchrotron Radiation News

Author:

Cerrina F.,Isoyan A.,Jiang F.,Cheng Y. C.,Leonard Q.,Wallace J.,Heinrich K.,Ho A.,Efremov M.,Nealey P.

Publisher

Informa UK Limited

Subject

Nuclear and High Energy Physics,Atomic and Molecular Physics, and Optics

Link

http://www.tandfonline.com/doi/pdf/10.1080/08940880802268236

Reference30 articles.

1. Resolving Power and Information

2. Superresolution for Nonbirefringent Objects

3. Extreme ultraviolet light sources for use in semiconductor lithography—state of the art and future development

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Engineering study of extreme ultraviolet interferometric lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2009-04-01

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