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Crystallization of amorphous Si0.5Ge0.5films studied by means ofin-situX-ray diffraction andin-situtransmission electron microscopy

  • Published:1999-11 Issue:11 Volume:79 Page:2617-2628
  • ISSN:0141-8610
  • Container-title:Philosophical Magazine A
  • language:en
  • Short-container-title:Philosophical Magazine A

Author:

Edelman F.,Raz T.,Komem Y.,Zaumseil P.,Osten H.-J.,Capitan M.

Publisher

Informa UK Limited

Subject

Metals and Alloys,Physics and Astronomy (miscellaneous),Condensed Matter Physics,General Materials Science,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Crystallization of amorphous sputtered NiTi thin films;Materials Science and Engineering: A;2006-11

2. Grain size estimations from the direct measurement of nucleation and growth;Applied Physics Letters;2005-09-19

3. Experimental determination of kinetic parameters for crystallizing amorphous NiTi thin films;Applied Physics Letters;2005-09-12

4. Compositional Effects on the Crystallization Kinetics of Nickel Titanium Thin Films;Journal of Materials Research;2005-07-01

5. Finite size effects in phase transformation kinetics in thin films and surface layers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-02
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