The picture tells the story: Using surface morphology to probe chemical etching reactions
Author:
Publisher
Informa UK Limited
Subject
Physical and Theoretical Chemistry
Link
http://www.tandfonline.com/doi/pdf/10.1080/01442350110071966
Reference49 articles.
1. Molecular Imaging and Local Density of States Characterization at the Si(111)/NaOH Interface
2. Organosilanes
3. Comparison and Reproducibility of H-Passivation of Si(100) with HF in Methanol, Ethanol, Isopropanol and Water by IBA, TMAFM, and FTIR'
4. Scale of acidities in the gas phase from methanol to phenol
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