Thermal Characterization of Tungsten Thin Films by Pulsed Photothermal Radiometry-Reference-Cited by-同舟云学术

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Thermal Characterization of Tungsten Thin Films by Pulsed Photothermal Radiometry

Published:2006-12 Issue:4 Volume:10 Page:333-344
ISSN:1556-7265
Container-title:Nanoscale and Microscale Thermophysical Engineering
language:en
Short-container-title:Nanoscale and Microscale Thermophysical Engineering

Author:

Martan J.,Semmar N.,Boulmer-Leborgne C.,Plantin P.,Le Menn E.

Publisher

Informa UK Limited

Subject

Mechanics of Materials,Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

Link

http://www.tandfonline.com/doi/pdf/10.1080/15567260601009189

Reference30 articles.

1. Development of tungsten coated first wall and high heat flux components for application in ASDEX Upgrade

2. Review of recent works in development and evaluation of high-Z plasma facing materials

3. Sputtered tungsten films on polyimide, an application for X-ray masks

4. An ellipsometric study of W thin films deposited on Si

5. Improvements of on-membrane method for thin film thermal conductivity and emissivity measurements

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3. Measurement of High-temperature Thermophysical Properties of Bulk and Coatings Using Modulated Photothermal Radiometry;International Journal of Heat and Mass Transfer;2021-05

4. Heat accumulation temperature measurement in ultrashort pulse laser micromachining;International Journal of Heat and Mass Transfer;2021-04

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