Reactive Phase Formation in Thin Film Metal/Metal and Metal/Silicon Diffusion Couples-Reference-Cited by-同舟云学术

Reactive Phase Formation in Thin Film Metal/Metal and Metal/Silicon Diffusion Couples

Published:2003-07 Issue:3 Volume:28 Page:185-230
ISSN:1040-8436
Container-title:Critical Reviews in Solid State and Materials Sciences
language:en
Short-container-title:Critical Reviews in Solid State and Materials Sciences

Author:

Laurila Tomi¹,Molarius Jyrki²

Affiliation:

1. a Lab. of Electronics Production Technology, Helsinki University of Technology, P.O. Box 3000, FIN-02015 HUT, Finland

2. b VTT Microelectronics, P.O. Box 1101, FIN-02044 VTT, Finland

Publisher

Informa UK Limited

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,General Chemical Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10408430390261955

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