ENERGY DEPOSITION AND NON-THERMAL ABLATION IN FEMTOSECOND LASER GROOVING OF SILICON
Author:
Publisher
Informa UK Limited
Subject
Industrial and Manufacturing Engineering,Mechanical Engineering,General Materials Science
Link
http://www.tandfonline.com/doi/pdf/10.1080/10910344.2011.595324
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1. Characterization of laser ablation of solid targets with near-infrared laser pulses of 100fs and 1ps duration
2. Femtosecond laser ablation of silicon–modification thresholds and morphology
3. A general continuum approach to describe fast electronic transport in pulsed laser irradiated materials: The problem of Coulomb explosion
4. Theoretical investigations of material modification using temporally shaped femtosecond laser pulses
5. Numerical investigation of ultrashort laser damage in semiconductors
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