Measurements of the channeling effect in sputtering
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577308232270
Reference14 articles.
1. Angular dependent sputtering of copper single crystals by 20 keV noble gas ions
2. Sputtering Yields of Single Crystals Bombarded by 1‐ to 10‐keV Ar+ Ions
3. Single-crystal sputtering including the channeling phenomenon
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4. Crystallographic target effects in magnetron sputtering;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1987-07
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