1. Scavuzzo, R. J. 1972. International Electron Devices Meeting. Dec.4–61972. Washington, DC
2. Surface Effects on Metal‐Silicon Contacts
3. Diffusivity and Solubility of Si in the Al Metallization of Integrated Circuits
4. Kräutle, H. and Kalbitzer, S. Proceedings of the Second International Conference on Ion Implantation in Semiconductors, Garmisch-Partenkirchen. Berlin: Springer-Verlag.
5. On silicon amorphization during different mass ion implantation