Author:
Schmidt M.,Glaefeke H.,Drenckhan J.,Wild W.
Cited by
10 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. TAPE of Si Wafers;Springer Series in Surface Sciences;2022-11-25
2. Exoelectron emission due to relaxation processes at surfaces;Physica Status Solidi (a);1981-01-16
3. Exoelectron Emission;Microscopic Aspects of Adhesion and Lubrication, Proceedings of the 34th International Meeting of the Société de Chimie Physique;1981
4. A study of radiation damage in thin SiO2 layers with TSEE and IR techniques;Physica Status Solidi (a);1980-12-16
5. Radiation-Induced Charge Storage and Polarization Effects;Topics in Applied Physics;1980