Validity of the continuum approximation in calculating the scattering yields for atom location
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577608234779
Reference25 articles.
1. Picraux, S. T. 1975.New Uses of Ion Accelerators, Edited by: Ziegler, J. F. 229New York: Plenum Press.
2. Location of impurities in alkali halide crystals by channeling studies
3. The interaction of channeled ions with foreign atoms in crystals
4. Anomalously high yields of elastically scattered12C-ions from Zr, Hf, Tl, and Hg atoms implanted into silicon
5. The use of channeling-effect techniques to locate interstitial foreign atoms in silicon
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1. Transmission ion channeling facility for structural studies of monolayer films on clean semiconductor surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1993-05
2. Theory of charged particle scattering in crystals by the generalized optical potential method;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-06
3. Analytical description of yields from resonant nuclear reactions induced by channeled particles using a statistical approach;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1988-06
4. Study of crystal defects using ion channelling and channelling radiation;Bulletin of Materials Science;1988-03
5. Materials Research with Channeling Combined with RBS, NRA and PIXE;Nuclear Physics Applications on Materials Science;1988
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