The Influence of Deposition Rate on the Structure and Morphology of Gold/Silicon(111) Growth by Molecular Beam Epitaxy-Reference-Cited by-同舟云学术

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The Influence of Deposition Rate on the Structure and Morphology of Gold/Silicon(111) Growth by Molecular Beam Epitaxy

Published:2015-05-08 Issue:3 Volume:49 Page:400-410
ISSN:0003-2719
Container-title:Analytical Letters
language:en
Short-container-title:Analytical Letters

Author:

Marconi Daniel,Colniţă Alia,Turcu Ioan

Funder

Executive Unit for Financing Education Higher, Research and Development and Innovation

Publisher

Informa UK Limited

Subject

Electrochemistry,Biochemistry (medical),Clinical Biochemistry,Spectroscopy,Biochemistry,Analytical Chemistry

Link

http://www.tandfonline.com/doi/pdf/10.1080/00032719.2015.1022823

Reference35 articles.

1. Molecular beam epitaxy

2. In situ investigation of stage of the formation of eutectic alloys in Si–Au and Si–Al systems

3. Ultrathin metal films and particles on oxide surfaces: structural, electronic and chemisorptive properties

4. Molecular beam epitaxy

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1. Impact of deposition rate on structural, morphological and optical properties of E-beam evaporated chromium thin film;Materials Today: Proceedings;2024-05

2. Explore the investigation of structural and morphological characteristics of E-beam evaporated copper thin film of various thicknesses;AIP Conference Proceedings;2024

3. The adhesion of L-methionine amino acid through Dip Pen Nanolithography on silver thin films grown by Molecular Beam Epitaxy technique;Journal of Molecular Structure;2021-11

4. Nanoaperture fabrication in ultra-smooth single-grain gold films with helium ion beam lithography;Nanotechnology;2020-08-28

5. Design complexity of DPN patterning with Cr3+ and Co2+ metallic ions on Au (111) thin film;Journal of Alloys and Compounds;2018-05

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