Plasma resistance of quartz with a glass coating layer by aerosol deposition
Author:
Affiliation:
1. Department of Materials Science & Engineering, Inha University, Incheon, Republic of Korea
Funder
Ministry of Trade, Industry and Energy
Publisher
Informa UK Limited
Subject
Industrial and Manufacturing Engineering,Ceramics and Composites
Link
https://www.tandfonline.com/doi/pdf/10.1080/17436753.2017.1422332
Reference24 articles.
1. Reduction of Particle Contamination in Plasma-Etching Equipment by Dehydration of Chamber Wall
2. Issues in Etching Compound and Si-based Devices
3. Optimum reactive ion etching ofx-cut quartz using SF6and Ar
4. Fragmentation behavior of Y 2 O 3 suspension in axially fed suspension plasma spray
5. Plasma-Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process
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3. Deposition behavior of glass thick film formation on substrates with different hardness by aerosol deposition;Journal of Asian Ceramic Societies;2021-06-25
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