Sources of Particle Contamination in an IC Manufacturing Environment-Reference-Cited by-同舟云学术

Sources of Particle Contamination in an IC Manufacturing Environment

Published:1992-01 Issue:1 Volume:16 Page:43-50
ISSN:0278-6826
Container-title:Aerosol Science and Technology
language:en
Short-container-title:Aerosol Science and Technology

Author:

Clark L. A.,Hastie T.,Psota-Kelty L. A.,Sinclair J. D.,Rauchut J.

Publisher

Informa UK Limited

Subject

Pollution,General Materials Science,Environmental Chemistry

Link

http://www.tandfonline.com/doi/pdf/10.1080/02786829208959536

Reference4 articles.

1. Becker , R. A. , Chambers , J. M. , and Wilks , A. R. ( 1988 ).The New S Language.Wadsworth , Pacific Grove , CA , p. 320

2. Muller , A. J. , Psota-Kelty , L. A. , Sinclair , J. D. , and Morrison , P. W. ( 1989 ).Proceedings of Symposium On Semiconductor Cleaning Technology, The Electrochemical Society , Pennington , NJ , p. 204 .

3. Stern , A. C. ( 1976 ).Air Pollution – Measuring, Monitoring, and Surveillance, Vol. III.Academic Press , New York , p. 15 .

4. Viner , A. S. , and Donovan , R. P. ( 1988 ).Proceedings of the Institute of Environmental Sciences 34th Annual Technical Meeting.King of Prussia, PA, p. 342 .

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