High Temperature Oxidation of TiAlN Thin Films for Memory Devices
Author:
Affiliation:
1. a Dept. of Materials Engineering , Sangju National University , 386, Gajang-dong, Sangju, Kyungbuk , 742-711 , Korea
2. b Dept. of Materials Engineering , Chungnam National University , Daeduk Science Town, Daejeon , 305-764 , Korea
Publisher
Informa UK Limited
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/713718323
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