Basic properties mapping of anodic oxides in the hafnium–niobium–tantalum ternary system-Reference-Cited by-同舟云学术

Basic properties mapping of anodic oxides in the hafnium–niobium–tantalum ternary system

Published:2018-08-13 Issue:1 Volume:19 Page:554-568
ISSN:1468-6996
Container-title:Science and Technology of Advanced Materials
language:en
Short-container-title:Science and Technology of Advanced Materials

Author:

Mardare Andrei Ionut¹²^ORCID,Mardare Cezarina Cela¹³^ORCID,Kollender Jan Philipp¹,Huber Silvia¹³^ORCID,Hassel Achim Walter¹²³^ORCID

Affiliation:

1. Institute for Chemical Technology of Inorganic Materials, Johannes Kepler University Linz , Linz, Austria

2. Competence Centre for Electrochemical Surface Technology , Wiener Neustadt, Austria

3. Christian Doppler Laboratory for Combinatorial Oxide Chemistry, Institute for Chemical Technology of Inorganic Materials, Johannes Kepler University Linz , Linz, Austria

Funder

Christian Doppler Forschungsgesellschaft

Competence Centre for Electrochemical Surface Technology

Publisher

Informa UK Limited

Subject

General Materials Science

Link

https://www.tandfonline.com/doi/pdf/10.1080/14686996.2018.1498703

Reference40 articles.

1. A review of high throughput and combinatorial electrochemistry

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3. High-Throughput Screening for Combinatorial Thin-Film Library of Thermoelectric Materials

4. High-Throughput Structural and Functional Characterization of the Thin Film Materials System Ni–Co–Al

5. Investigations on Bactericidal Properties of Molybdenum–Tungsten Oxides Combinatorial Thin Film Material Libraries

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