Silicon etch with chromium ions generated by a filtered or non-filtered cathodic arc discharge-Reference-Cited by-同舟云学术

Silicon etch with chromium ions generated by a filtered or non-filtered cathodic arc discharge

Published:2016-02-23 Issue:1 Volume:17 Page:20-28
ISSN:1468-6996
Container-title:Science and Technology of Advanced Materials
language:en
Short-container-title:Science and Technology of Advanced Materials

Author:

Scopece Daniele¹,Döbeli Max²,Passerone Daniele¹,Maeder Xavier³,Neels Antonia⁴,Widrig Beno⁵,Dommann Alex¹,Müller Ulrich³,Ramm Jürgen⁵

Affiliation:

1. nanotech@surfaces laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600, Dübendorf, Switzerland

2. Ion Beam Physics, ETH Zürich, Otto-Stern-Weg 5, CH-8093, Zürich, Switzerland

3. Laboratory for Nanoscale Materials Science, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland

4. Center for X-ray Analytics, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland

5. Oerlikon Surface Solutions AG, Oerlikon Balzers, Iramali 18, 9469 Balzers, Liechtenstein

Funder

CTI

Marie-Curie Cofund Project

Publisher

Informa UK Limited

Subject

General Materials Science

Link

https://www.tandfonline.com/doi/pdf/10.1080/14686996.2016.1140308

Reference20 articles.

1. Cathodic Arcs

2. A new method for hard coatings: ABS TM (arc bond sputtering)

3. Optimization ofin situsubstrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics

4. Combined filtered cathodic arc etching pretreatment–magnetron sputter deposition of highly adherent CrN films

5. Tridyn — A TRIM simulation code including dynamic composition changes