Analysis of Fullerite C60Electron Induced Modification in Terms of Effective Destruction Cross-section
Author:
Publisher
Informa UK Limited
Subject
Organic Chemistry,Physical and Theoretical Chemistry,General Materials Science,Atomic and Molecular Physics, and Optics
Link
http://www.tandfonline.com/doi/pdf/10.1080/1536383X.2012.655115
Reference8 articles.
1. Nanolithography Using Fullerene Films as an Electron Beam Resist
2. Fullerite C60 as electron-beam resist for ‘dry’ nanolithography
3. Electron-beam-induced fragmentation in ultrathinC60films onSi(100)−2×1−H:Mechanisms of cage destruction
4. Electron-stimulated fragmentation mechanism for fullerene films onSi(111)−(7×7)surfaces: Dependence on thickness and electron flux
5. Electron Impact Ionization ofC60
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Transition from weak to strong light-molecule coupling: Application to fullerene C60 multilayers in metallic cavity;Physical Review B;2022-11-01
2. Prediction of Strong Transversal s(TE) Exciton–Polaritons in C60 Thin Crystalline Films;International Journal of Molecular Sciences;2022-06-22
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