Author:
Chen Yuh‐Chyoung,Hwang Huey‐Liang,Fou Cheng‐Ming,Liue Jung‐Chen
Reference20 articles.
1. A bird's beak free local oxidation technology feasible for VLSI circuits fabrication
2. Chiu, K. Y., Cham, K. M. and Moll, J. L. “Application of Side Wall Masked Isolation Technology for Scaled CMOS/VLSI Circuits,”. Proc. of 1983 Int. Symp. VLSI Tech. Syst. Appl. Taipei, Taiwan, R. O. C. pp.270
3. Stoichiometry and Masking Ability of LPCVD Silicon Nitride Against Arsenic Diffusion