Deep radiation damage in copper after ion implantation-Reference-Cited by-同舟云学术

Deep radiation damage in copper after ion implantation

Published:1985-01 Issue:6 Volume:87 Page:281-292
ISSN:0033-7579
Container-title:Radiation Effects
language:en
Short-container-title:Radiation Effects

Author:

Friedland E.,Le Roux H.,Malherbe J. B.

Publisher

Informa UK Limited

Subject

General Engineering

Link

http://www.tandfonline.com/doi/pdf/10.1080/01422448608209733

Reference16 articles.

1. Linker, G., Gettings, M. and Meyer, O. 1973.Ion Implantation in Semiconductors and other Materials, Edited by: Crowder, B. L. 465New York: Plenum.

2. Gettings, M., Langguth, K. G. and Linker, G. 1974.Applications of Ion Beams to Metals, Edited by: Picraux, S. T., EerNisse, E. P. and Vook, F. L. 241New York: Plenum.

3. Radiation damage in copper single crystals

4. Vos, M. and Boerma, D. O. Proc. Seventh Int. Conf. Ion Beam Analysis. Berlin.

5. Friedland, E., Malherbe, J. B., Alberts, H. W., Vorster, R. E. and Prins, J. F. Proc. Seventh Int. Conf. Ion Beam Analysis. Berlin.

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