A comparison of diol and methanol-based chemical solution deposition routes for PZT thin film fabrication-Reference-Cited by-同舟云学术

A comparison of diol and methanol-based chemical solution deposition routes for PZT thin film fabrication

Published:1997-09 Issue:1-4 Volume:18 Page:275-286
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Schwartz Robert W.¹,Reichert Tammy L.¹,Clem Paul G.¹,Dimos Duane¹,Liu David²

Affiliation:

1. a Sandia National Laboratories, The Advanced Materials Laboratory , P. O. Box 5800, MS 1349, Albuquerque, NM, 87185-1349, USA

2. b AVX Corporation, Advanced Product and Technology Center , SC, Myrtle Beach, 29577, USA

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584589708221705

Reference23 articles.

1. Ferroelectric materials for 64 Mb and 256 Mb DRAMs

2. Ferroelectric Memories

3. Integrated ferroelectrics as a strategic device

4. Control of Leakage Resistance in Pb(Zr,Ti)O3 Thin Films by Donor Doping

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