Studies of ferroelectric film growth processes using in situ, real-time ion beam analysis-Reference-Cited by-同舟云学术

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Studies of ferroelectric film growth processes using in situ, real-time ion beam analysis

Published:1997-09 Issue:1-4 Volume:18 Page:351-368
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Krauss A. R.¹,Auciello O.¹,Im J.¹,Smentkowski V.¹,Gruen D. M.¹,Irene E. A.²,Chang R. P. H.³

Affiliation:

1. a Argonne National Laboratory, Materials Science and Chemistry Divisions , Argonne, IL, 60439

2. b University of North Carolina, Department of Chemistry , Chapel Hill, North Carolina, 27709

3. c Northwestern University, Department of Materials Science , Evanston, IL, 60208

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584589708221712

Reference28 articles.

1. Science and Technology of Electroceramic Thin Films

2. 1992. Pulsed Laser Ablation Deposition.MRS Bulletin, 17

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