Second generation liquid source misted chemical deposition (LSMCD) technology for ferroelectric thin films-Reference-Cited by-同舟云学术

Second generation liquid source misted chemical deposition (LSMCD) technology for ferroelectric thin films

Published:1997-09 Issue:1-4 Volume:18 Page:127-136
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Solayappan Narayan¹,Mcmillan Larry D.¹,de Araujo Carlos A. Paz¹,Grant Bob²

Affiliation:

1. a Symetrix Corporation , 5055 Mark Dabling Blvd., Colorado Springs, Colorado, 80918, USA

2. b SubMicron Systems Corporation , 6330 Hedgewood Drive #150, Allentown, Pennsylvania, 18106, USA

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584589708221693

Reference5 articles.

1. Manufacturing of perovskite thin films using liquid delivery MOCVD

2. Liquid source misted chemical deposition (LSMCD)–a critical review

3. Conformal LSMCD deposition of SrBi2(Ta1-xNbx)2O9

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