Evaluation of electrical properties and SIMS profiles on forming gas(N2-H2) annealed Pt/PZT/Pt capacitors
Author:
Affiliation:
1. a Advanced Material & FRAM Development Dept. , ULSI Develop. Div. FUJITSU LIMITED , 1-1, Kamikodanaka 4-chome, Nakahara-Ku, Kawasaki
2. b Material Characterization Center. FUJITSU LABORATORIES LTD , 10-1, Morinosato-Wakamiya, Atsugi , Japan
Publisher
Informa UK Limited
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/10584589808202054
Reference7 articles.
1. Ferroelectric non-volatile memories for low-voltage, low-power applications
2. The effects of the catalytic nature of capacitor electrodes on the degradation of ferroelectric Pb(Zr,Ti)O3 thin films during reductive ambient annealing
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