LASER HEATING OF SILICON: A KINETIC THEORY APPROACH-Reference-Cited by-同舟云学术

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LASER HEATING OF SILICON: A KINETIC THEORY APPROACH

Published:1999-11 Issue:6 Volume:36 Page:563-584
ISSN:1040-7782
Container-title:Numerical Heat Transfer, Part A: Applications
language:en
Short-container-title:Numerical Heat Transfer, Part A: Applications

Author:

Bekir S. Yilbas, S. J. Shuja

Publisher

Informa UK Limited

Subject

Condensed Matter Physics,Numerical Analysis

Link

http://www.tandfonline.com/doi/pdf/10.1080/104077899274570

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Response of thermoviscoelastic microbeams affected by the heating of laser pulse under thermal and magnetic fields;Physica Scripta;2020-11-10

3. Heat Conduction Analysis in an Anisotropic Thin Film Irradiated by an Ultrafast Pulse Laser Heating;Numerical Heat Transfer, Part A: Applications;2013-07-15

4. Laser Short-Pulse Heating: Influence of Spatial Distribution of Absorption Coefficient on Temperature Field in Silicon Film;Journal of Laser Micro/Nanoengineering;2012-05

5. Laser short-pulse heating of silicon film with the presence of metallic substrate;Current Applied Physics;2010-09

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