Electronic transport in glow-discharge microcrystalline germanium
Author:
Affiliation:
1. a Carnegie Laboratory of Physics , The University , Dundee DD1 4HN, Scotland
Publisher
Informa UK Limited
Subject
General Physics and Astronomy,General Chemical Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/13642818308246486
Reference12 articles.
1. Low‐temperature growth of polycrystalline Si and Ge films by ultraviolet laser photodissociation of silane and germane
2. Structural and electrical properties of polycrystalline Ge films
3. Low‐temperature crystallization of dopeda‐Si:H alloys
4. Thermoelectric power in phosphorous doped amorphous silicon
5. Transport properties of amorphous germanium prepared by the glow discharge technique
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