Surface texturisation for the reduction of light reflection in ZnO/Si heterojunction-Reference-Cited by-同舟云学术

Surface texturisation for the reduction of light reflection in ZnO/Si heterojunction

Published:2022-03-20 Issue:10 Volume:41 Page:1399-1407
ISSN:1478-6451
Container-title:International Journal of Sustainable Energy
language:en
Short-container-title:International Journal of Sustainable Energy

Author:

Kashyap Jyoti¹,Rani Manju¹²,Singh Udaibir³,Kapoor Avinashi¹

Affiliation:

1. Department of Electronic Science, University of Delhi, New Delhi, India

2. Department of Physics, Deshbandhu College, University of Delhi, New Delhi, India

3. Department of Electronics, Acharya Narendra Dev College, University of Delhi, New Delhi, India

Publisher

Informa UK Limited

Subject

Fluid Flow and Transfer Processes,Process Chemistry and Technology,General Energy,Fuel Technology,Renewable Energy, Sustainability and the Environment

Link

https://www.tandfonline.com/doi/pdf/10.1080/14786451.2022.2052292

Reference44 articles.

1. Oxygen Effect on Structural and Optical Properties of ZnO Thin Films Deposited by RF Magnetron Sputtering

2. Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer

3. A comparative analysis of deep level emission in ZnO layers deposited by various methods

4. Silicon Pyramid Structure as a Reflectivity Reduction Mechanism

5. Growth of pure ZnO thin films prepared by chemical spray pyrolysis on silicon

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