Properties of tetrahedral amorphous carbon films deposited in a filtered cathodic arc in the presence of hydrogen-Reference-Cited by-同舟云学术

Properties of tetrahedral amorphous carbon films deposited in a filtered cathodic arc in the presence of hydrogen

Published:1994-06 Issue:6 Volume:69 Page:1121-1131
ISSN:1364-2812
Container-title:Philosophical Magazine B
language:en
Short-container-title:Philosophical Magazine B

Author:

Davrs C. A.¹²,Veerasamy V. S.¹,Amaratunga G. A. J.¹,Milne W. I.¹,McKenzie D. R.³

Affiliation:

1. a Department of Engineering , University of Cambridge , Trumpington Street, Cambridge , CB2 1PZ , England

2. c Department of Materials , Science and Metallurgy, University of Cambridge , Cambridge , CB2 3QZ , UK

3. b School of Physics, University of Sydney , New South Wales

Publisher

Informa UK Limited

Subject

General Physics and Astronomy,General Chemical Engineering

Link

https://www.tandfonline.com/doi/pdf/10.1080/01418639408240182

Reference21 articles.

1. Amorphous diamond‐Si semiconductor heterojunctions

2. Influence of dc bias voltage on the refractive index and stress of carbon‐diamond films deposited from a CH4/Ar rf plasma

3. Anders , A. Anders , S. Juttner , B. Botticher , W. Luck , H. and Schroder , G. Proceedings of the 15th International Symposium on Discharges and Electrical Insulation in Vacuum. 1992, Darmstadt. pp.653–658. Berlin: Verlag.

4. EELS analysis of vacuum arc-deposited diamond-like films

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