Role of boron in the structural and electronic properties of hydrogenated silicon films deposited by r.f. magnetron sputtering-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Role of boron in the structural and electronic properties of hydrogenated silicon films deposited by r.f. magnetron sputtering

Published:1995-02 Issue:2 Volume:71 Page:115-125
ISSN:1364-2812
Container-title:Philosophical Magazine B
language:en
Short-container-title:Philosophical Magazine B

Author:

Banerjee Ratnabali¹,Bhattacharyya T. K.¹,Sharma S. N.¹,Batabyal A. K.¹,Barua A. K.¹,Banerjee Dipali²,Bhusari D. M.³,Kshirsagar S. T.³

Affiliation:

1. a Energy Research Unit, Indian Association for the Cultivation of Science , Jadavpur, Calcutta , 700 032 , India

2. b Department of Solid State Physics , Indian Association for the Cultivation of Science , Jadavpur, Calcutta , 700 032 , India

3. c National Chemical Laboratory , Pune , 411 008 , India

Publisher

Informa UK Limited

Subject

General Physics and Astronomy,General Chemical Engineering

Link

https://www.tandfonline.com/doi/pdf/10.1080/01418639508240300

Reference21 articles.

1. Formation of microcrystallinity in hydrogenated silicon films deposited with a simple modification of the magnetron sputtering method

2. The influence of deposition parameters on the properties of amorphous silicon thin films produced by the magnetron sputtering method

3. Temperature-dependent Raman studies of hydrogenated-amorphous-silicon films

4. De , A. Ghosh , S. Ray , S. and Barua , A. K. Proceedings of the Sixth International Photovoltaics Science and Engineering Conference. 1992. pp.73

5. Dependence of resistivity on the doping level of polycrystalline silicon

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A simple modification of the magnetron sputtering method for the deposition of boron-doped hydrogenated microcrystalline silicon films with enhanced doping efficiency;Thin Solid Films;1997-04

2. Influence of Chamber Pressure on Optoelectronic and Structural Properties of Boron-Doped Hydrogenated Silicon Films Prepared by RF Magnetron Sputtering;Japanese Journal of Applied Physics;1996-05-15

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3