Preparation and first principle calculation of Cu<sub>2</sub>O thin films-Reference-Cited by-同舟云学术

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Preparation and first principle calculation of Cu₂O thin films

Published:2022-07-04 Issue:1 Volume:594 Page:22-32
ISSN:0015-0193
Container-title:Ferroelectrics
language:en
Short-container-title:Ferroelectrics

Author:

Luo Jiaolian¹²,Lu Jiayong¹²,Yang Anqi¹³,Yang Yang¹²,Wang Kun¹²,Song Xiang¹²,Zhou Wenjiang¹²,Zhao Debing¹²

Affiliation:

1. Special and Key Laboratory of Guizhou Provincial Higher Education for Green Energy-Saving Materials, Guiyang, China

2. School of Materials Science and Engineering, Guizhou Minzu University, Guiyang, China

3. College of Big Data and Information Engineering, Guizhou University, Guiyang, China

Publisher

Informa UK Limited

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/00150193.2022.2078113

Reference17 articles.

1. Cuprite, paramelaconite and tenorite films deposited by reactive magnetron sputtering

2. Optical and structural properties of nanocrystalline copper oxide thin films prepared by activated reactive evaporation

3. Evolution of nanostructure, phase transition and band gap tailoring in oxidized Cu thin films

4. The preparation of copper(II) oxide thin films and the study of their microstructures and optical properties

5. Electrodeposition of 1.4-eV-Bandgap p-Copper (II) Oxide Film With Excellent Photoactivity

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